E-Beam (Electron beam) lithography is today's standard technology for application in the world of nanotechnology. E-beam direct writing provides the capability to significantly reduce cycle time during system development by quickly providing the hundreds of different chips needed for a single mainframe. For this process to be successful, the highest level of temperature, humidity, EMI and vibration control has to be achieved.

Seminet Automation is the leader in the design and development of custom E-beam enclosures for the semiconductor industry. Seminet Automation provides a complete solution for your E-beam requirements which includes the following: