See Product Demo (requires Windows Media Player or other .mpg player)

The Safeguard-RIS Reticle Inspection System is the next generation in high throughput automated reticle inspection for reticles up to 230mm (9") square. The Safeguard-RIS features a fully automated reticle inspection system which prevents mask damage and mishandling normally encountered in manual inspection processes. The Safeguard-RIS provides improved stepper utilization and reduced lithography rework as a result of defect-free reticles presented to the stepper in the proper orientation. As well as reduced pellicle damage. Particle contamination can disrupt and delay the photolithography process, resulting in yield and productivity losses. In order to avoid this, masks need to be routinely re-qualified.
The solution is the automated Particle Detection System which enables fabs to perform a complete inspection on each reticle prior to its use. This approach provides a more cost-effective and more reliable solution to the method of visual inspection. The Safeguard-RIS unique design meets the high demand of today's lithography and mask house requirements by providing:
• ISO Class 3 or better storage environment
• Advanced reticle handling robotics with edge grip end-effector
• 10µm or greater automated Detection System standard
• An optional 1µm Particle Detection System is available when required
• Optional N2 Particle removal system with in line 0.03µm particle filtration and ionization.
• Smallest footprint in the market
• SEMI compliant load ports
• Supports multiple reticle pods such as 200mm SMIF, 150mm SMIF, Canon, Nikon, and ASML.
• Optional Pre-aligner with integrated reticle/pellicle ID
• Optional Pellicle Removal System
• Optional Pellicle Mounting System
• Optional Temperature control: ±0.01°C
• Optional Humidity Control: ±0.1% RH (Relative Humidity)
• Optional Integrated AMC Chemical Filtration
Data/Results Presentation
The Safeguard-RIS offers a User friendly Graphical User Interface (GUI) according to SEMI standards. The Safeguard-RIS reports the number of detected particles on the chrome surface,the pellicle surface on the chrome side, the glass surface, and the the pellicle surface on the glass side. Contamination data, such as the number of detected particles, ESD size and xy-coordinates, will be displayed in a defect map, defect table and defect size histogram, providing a quick overview.